Deep sub micron high aspect ratio polymer structures produced by hard X-ray lithography

Microsystem Technologies

Volumn 10, Issue 6-7, 2004, Pages 493-497

  Achenbach, S ^a  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; IRRADIATION; SEMICONDUCTOR DEVICES; SUBSTRATES; SYNCHROTRON RADIATION; X RAY LITHOGRAPHY;

ELECTRON ENERGY; MASK ABSORBERS; POLYMER STRUCTURES;

POLYMERS;

EID: 10044270017     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-004-0379-2     Document Type: Conference Paper

References (13)

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