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Volumn 2005, Issue , 2005, Pages 68-69

Molecular resists based on cholate derivatives for electron-beam lithography

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Indexed keywords


EID: 33847241917     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/imnc.2005.203741     Document Type: Conference Paper
Times cited : (2)

References (9)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.