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Volumn 2005, Issue , 2005, Pages 68-69
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Molecular resists based on cholate derivatives for electron-beam lithography
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 33847241917
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/imnc.2005.203741 Document Type: Conference Paper |
Times cited : (2)
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References (9)
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