Control of diamond micro-tip geometry for field emitter

Thin Solid Films

Volumn 377-378, Issue , 2000, Pages 299-302

  Baik, E S ^a,b,c   Baik, Y J ^a   Jeon, D ^b  

^a Korea Institute of Science and Technology   (South Korea)

^b Myong Ji University   (South Korea)

^c Smart Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; DRY ETCHING; MASKS; POLYCRYSTALLINE MATERIALS; SEMICONDUCTOR QUANTUM DOTS; SILICA;

ETCH-RESISTANT MASKS; POLYCRYSTALLINE DIAMOND FILMS;

DIAMOND FILMS;

EID: 18844464900     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01432-2     Document Type: Article

References (20)

1. Bozeman S.P., Baumann P.K., Ward B.L., Powers M.J., Cuomo J.J., Nemanich R.J., Dreifus D.L. Diamond Relat. Mater. 5:1996;802.
2. Kang W.P., Wisitsora-at A., Davidson J.L., Kerns D.V., Li Q., Xu J.F., Kim C.K. J. Vac. Sci. Technol. B. 16:1998;684.
3. P. Vaudaine, R. Meyer, IEEE IEDM Tech. Dig. (1991) 197.
4. Spindt C.A., Holland C.E., Rosengreen A., Brodie I. J. Vac. Sci. Technol. B. 11:1993;468.
5. Wei Y., Chalamala B.R., Smith B.G., Penn C.W. J. Vac. Sci. Technol. B. 17:1999;233.
6. Geis M.W., Twichell J.C., Macaulay J., Okano K. Appl. Phys. Lett. 67:1995;1328.
7. Cutler P.H., Huang Z.-H., Miskovsky N.M., D'Ambrocio P., Chung M. J. Vac. Sci. Technol. B. 14:1996;2020.
8. Zhu W., Kochansky G.P., Jin S. Science. 282:1998;1471.
9. Y.C. Ko, SeGi Yu, W.B. Choi, D. Jeon, N.S. Lee, H.W. Lee, J.M. Kim, Technical Digest of 12th International Vacuum Microelectronics Conference, Darmstadt, Germany, July 6-9, 1999 p. 134.
10. Wang C., Garcia A., Ingram D.C., Lake M., Kordesh M.E. Electron. Lett. 27:1991;1459.
11. Göhl A., Habermann T., Nau D., Müller G., Raiko V., Theirich D., Engemann J. J. Vac. Sci. Technol. B. 17:1999;696.
12. Li Tolt Z., Fink R.L., Yaniv Z. J. Vac. Sci. Technol. B. 16:1998;1197.
13. Kang W.P., Davidson J.L., George M.A., Milosavljevic I., Li Q., Xu J.F., Kerns D.V. J. Vac. Sci. Technol. B. 15:1996;460.
14. Okano K., Hoshina K., Iida M., Koizumi S., Inuzuka T. Appl. Phys. Lett. 64:1994;2742.
15. Cho H.S., Baik Y.-J., Jeon D. Ultramicroscopy. 73:1998;684.
16. Baik E.-S., Baik Y.-J., Jeon D. Diamond Relat. Mater. 8:1999;2169.
17. Sze S.M. VLSI Technology. 1988;204 McGraw-Hill, Singapore.
18. Ramesham R., Loo B.H. J. Electrochem. Soc. 139:1992;1988.
19. Sandhu G.S., Chu W.K. Appl. Phys. Lett. 55:1989;437.
20. Dorsh O., Werner M., Obermeier E. Diamond Relat. Mater. 4:1995;456.