Microwave plasma-enhanced chemical vapor deposition of carbon nanostructures using biological molecules

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 4 A, 2005, Pages 1562-1563

  Yoshimura, Masamichi ^a   Tanaka, Kei ^a   Ueda, Kazuyuki ^a  

^a TOYOTA TECHNOLOGICAL INSTITUTE   (Japan)

Author keywords

AFM; Biology; CVD; Ferritin; ONT

Indexed keywords

ATOMIC FORCE MICROSCOPY; BIOLOGICAL MATERIALS; COATING TECHNIQUES; ELECTRODES; HYDROPHILICITY; IONIZATION; MICROWAVES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON WAFERS;

BIOLOGICAL MOLECULES; CARBON NANOSTRUCTURES; FERRITIN MOLECULES; HIGH-ENERGY IONS;

CARBON NANOTUBES;

EID: 21244441138     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.44.1562     Document Type: Article

References (6)

1. R. Saito, O. Dresselhaus and M. S. Dresselhaus: Physical Properties of Carbon Nanotubes (Imperial College Press, London, 1998).
2. Y. Li, W. Kim, Y. Zhang, M. Rolandi, D. Wang and H. Dai: J. Phys. Chem. B 105 (2001) 11424.
3. Y. Zhang, Y. Li, W. Kim and H. Dai: Appl. Phys. A 74 (2002) 325.
4. J. Bonard, P. Chauvin and C. Klinke: Nano Lett. 2 (2002) 665.
5. Y. Li, D. Mann, M. Rolandi, W. Kim, A. Ural, S. Hung, A. Javey, D. Wang, E. Yenilmez, Q. Wang, J. F. Gibbons, Y. Nishi and H. Dai: Nano Lett. 4 (2004) 317.
6. H. Fujimori, H. Yoshimura and A. Hatta: J. Jpn. Assoc. Cryst. Growth 30 (2003) 38.