Down to 2 nm ultra shallow junctions: Fabrication by IBS plasma immersion ion implantation prototype PULSION®

AIP Conference Proceedings

Volumn 866, Issue , 2006, Pages 609-613

  Torregrosa, Frank ^a   Etienne, Hasnaa ^a   Mathieu, Gilles ^a   Roux, Laurent ^a  

^a Ion Beam Services   (France)

Author keywords

Plasma immersion ion implantation (PHI); Ultra shallow junctions (USJ)

Indexed keywords

EID: 33846949365     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.2401591     Document Type: Conference Paper

References (20)

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