Development of ruthenium dioxide electrodes for pyroelectric devices based on lithium tantalate thin films

Thin Solid Films

Volumn 515, Issue 7-8, 2007, Pages 3971-3977

  Nougaret, Laurianne ^a   Combette, Philippe ^a   Arinero, Richard ^a   Podlecki, Jean ^a   Pascal Delannoy, Frédérique ^a  

^a UNIVERSITÉ MONTPELLIER II   (France)

Author keywords

Lithium tantalate; Pyroelectric properties; Ruthenium oxide; Sputtering

Indexed keywords

CRYSTALLIZATION; LITHIUM COMPOUNDS; MAGNETRON SPUTTERING; PYROELECTRICITY; RUTHENIUM COMPOUNDS; THIN FILMS;

LITHIUM TANTALATE; PYROELECTRIC PROPERTIES; RUTHENIUM OXIDE;

ELECTRODES;

EID: 33846915405     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.09.023     Document Type: Article

References (36)

1. Paz de Araujo C.A., Scott J.F., and Taylor G.W. Ferroelectric Thin Films: Synthesis and Basic Properties (1996), Gordon and Breach, Amsterdam 193
2. Vijay D.P., and Desu S.B. J. Electrochem. Soc. 140 (1993) 2640
3. Oh Y.-J., Moon S.H., and Chung C.-H. J. Electrochem. Soc. 148 4 (2001) 56
4. Gril A., Beach D., Smart C., and Kane W. In: Meyers E.R., Tuttle B.A., Besu S.B., and Larsen P.K. (Eds). Ferroelectric thin films III, San Fransisco, U.S.A., 13-16 April, 1993. Mat. Res. Soc. Symp. Proc. vol. 310 (1993) 189
5. Yoon D.S., and Roh J.S. Semicond. Sci. Technol. 17 (2002) 599
6. Al-Shareef H.N., Kingon A.I., Chen X., and Bellur K.R. J. Mater. Res. 9 (1994) 2968
7. Al-Shareef H.N., Auciello O., and Kingon A.I. J. Appl. Phys. 77 (1995) 2146
8. Krusin-Elbaum L. Thin Solid Films 169 (1989) 17
9. Kolawa E., So F.C.T., Pan E.T.S., and Nicolet M.A. Appl. Phys. Lett. 50 (1987) 854
10. Kolawa E., So F.C.T., Flick W., Zhao X.A., Pan E.T.S., and Nicolet M.A. Thin Solid Films 173 (1989) 217
11. Sakiyama K., Onishi S., Ishihara K., Orita K., Kajiyama T., Hosoda N., and Hara T. J. Electrochem. Soc. 140 3 (1993) 834
12. Law C.W., Tong K.Y., Li J.H., Li K., and Poon M.C. Thin Solid Films 354 (1999) 162
13. Green M.L., Gross M.E., Papa L.E., Schnoes K.J., and Barsen D. J. Electrochem. Soc. 132 11 (1985) 2677
14. Smith K.C., Sun Y.M., Mettlach N.R., Hance R.L., and White J.M. Thin Solid Films 376 (2000) 73
15. Krusin-Elbaum L., Wittmer M., and Yee D.S. Appl. Phys. Lett. 50 (1989) 1879
16. Belkind A., Orban Z., Vossen J.L., and Woollam J.A. Thin Solid Films 207 (1992) 242
17. Kolawa E., Nieh C.W., So F.C.T., and Nicolet M. J. Electron. Mater. 17 (1988) 425
18. Hong S.K., Kim H.J., and Yang H.G. J. Appl. Phys. 80 2 (1996) 822
19. Desu S.B., Vijay D.P., Ramanathan S., Bhatt H.D., and Tirumala S. Thin Solid Films 350 (1999) 21
20. Lang S.B. Sourcebook of Pyroelectricity (1974), Gordon and Breach, New York
21. Yoon Y.S., Kim J.H., Schmidt A.M., Polla D.L., Wang Q., Gladfelter W.L., and Shin Y.H. J. Mater. Sci., Mater. Electron. 9 (1998) 465
22. Gopal Ganesan P., and Eizenberg M. Microelectron. Eng. 64 (2002) 449
23. Lee J.-G., Min S.-K., and Choh S.H. Jpn. J. Appl. Phys. 33 (1994) 7080
24. Lee J.G., Kim Y.T., Min S., and Choh S.H. J. Appl. Phys. 77 10 (1995) 5473
25. Rard J.A. Chem. Rev. 85 1 (1985) 1
26. Rogers D.B., Shannon R.D., Sleight A.W., and Gillson J.L. Inorg. Chem. 8 (1969) 841
27. Baborowski J., Muralt P., Lederman N., and Hiboux S. Vacuum 56 1 (2000) 51
28. Lim W.T., Cho K.R., and Lee C.H. Thin Solid Films 348 (1999) 56
29. Matsui Y., Hiratani M., and Kimura S. Jpn. J. Appl. Phys. 39 (2000) 256
30. Huang J.H., and Chen J.S. Thin Solid Films 382 (2001) 139
31. Mayadas A.F., and Shartzkes M. Phys. Rev., B 1 (1970) 1382
32. Mar Y., Liang J.S., Sun C.Y., and Huang Y.S. Thin Solid Films 238 (1994) 158
33. Pizzini S., Buzzanca G., Mari C., Rossi L., and Torchio S. Mater. Res. Bull. 7 5 (1972) 449
34. Lodi G., de Asmundis C., Ardizzone S., Sivieri E., and Trasatti S. Surf. Technol. 14 4 (1981) 335
35. Tomeno I., and Matsumura S. Phys. Rev., B 38 1 (1988) 606
36. Kohli C.H., Moser J., Prasad K., Schmid P.E., Levy F., and Burri G. Microelectron. Eng. 29 (1995) 201