Effect of oxygen content and thickness of sputtered RuOx electrodes on the ferroelectric and fatigue properties of sol-gel PZT thin films

Thin Solid Films

Volumn 354, Issue 1, 1999, Pages 162-168

  Law, C W ^a   Tong, K Y ^a   Li, J H ^b   Li, K ^b   Poon, M C ^c  

^a HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

^b CHANGZHOU UNIVERSITY   (China)

^c HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; ELECTROCHEMICAL ELECTRODES; FATIGUE OF MATERIALS; FERROELECTRIC MATERIALS; LEAD COMPOUNDS; OXYGEN; POLARIZATION; RUTHENIUM COMPOUNDS; SOL-GELS; SPUTTERING; THIN FILM DEVICES;

REMANENT POLARIZATION;

DIELECTRIC FILMS;

EID: 0033359322     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00409-5     Document Type: Article

References (22)

1. Chen C., Ryder D.F. J. Am. Ceram. Soc. 72:1989;1495.
2. Dey S.K., Zuleeg R. Ferroelectrics. 112:1990;309.
3. Chapin L.N., Myers S.A. Mater. Res. Soc. Symp. Proc. 200:1990;153.
4. Jaffe B., Cook W.R. Jr, Jaffe H. Piezoelectric Ceramics. 1971;Academic Press, New York.
5. Paz C.A. de Araujo, J.D. Cuchiaro, L.D. McMillan, M.C. Scott, J.F. Scott, Nature. 374:1995;627.
6. Kushida-Abdelghafar K., Miki H., Torii K., Fujisaki Y. Appl. Phys. Lett. 69:1996;3188.
7. Al-Shareef H.N., Bellur K.R., Auciello O., Kingon A.I. Integrated Ferroelectrics. 2:1994;185.
8. Vijay D.P., Desu S.B. J. Electrochem. Soc. 140:1993;2640.
9. Al-Shareef H.N., Kingon A.I., Chen X., Bellur K.R. J. Mater. Res. 9:1994;2968.
10. Al-Shareef H.N., Auciello O., Kingon A.I. J. Appl. Phys. 77:1995;2146.
11. Gril A., Beach D., Smart C., Kane W. Myers E.R., Tuttle B.A., Besu S.B, Larsen P.K. Ferroelectric Thin Films III. 310:1993;189 Mater Res. Soc. Poc.
12. Ramesh R., Inam A., Chau W.K., Tillerot F., Wilkens B., Chang C.C., Sands T., Tarascon J.M., Keramidas V.G. Appl. Phys. Lett. 59:1991;3542.
13. Vijay D.P., Desu S.B., Pan W. Myers E.R., Tuttle B.A., Besu S.B., Larseneds P.K. Ferroelectric Thin Films III. 310:1993;133 Mater. Res. Soc. Poc.
14. Horikawa T., Mikami N., Makita T., Tanimura J., Kataoka M., Sato K., Nunoshita M. Jpn. J. Appl. Phys. 32:1993;4126.
15. Bernstein S.D., Wong T.Y., Kisler Y., Tustison R.W. J. Mater. Res. 8:1993;12.
16. J.-G. Lee, S.-K. Min, S.-H. Choh, Jpn. J. Appl. Phys., 33 (1994) 7080.
17. Wang Q., Gladfelter W.L., Evans D.F., Fan Y., Franciosi A. J. Vac. Sci. Technol. A. 14:1996;747.
18. B.A. Tuttle, T.J. Garino, J.A. Voigt, T.J. Headley, D. Dimos, M.O. Eatough, in: O. Auciello, R. Waser (Eds.), Science and Technology of Electroceramic Thin Films, Proc. of the NATO Advanced Research Workshop on Science and Technology of Electroceramic Thin Films, Vol. 284, 1994, p. 117.
19. Al-Shareef H.N., Bellur K.R., Auciello O., Kingon A.I. Thin Solid Films. 256:1995;73.
20. Yoo I.K., Desu S.B. Phys. Stat. Sol. A. 133:1992;565.
21. Majumder S.B., Mohapatra Y.N., Agrawal D.C. Appl. Phys. Lett. 70:1997;138.
22. Yoshikawa K., Kimura T., Noshiro H., Otani S., Yamada M., Furumura Y. Jpn. J. Appl. Phys. 33:1994;L867.