Stress measurements of radio-frequency reactively sputtered RuO2 thin films

Journal of Applied Physics

Volumn 80, Issue 2, 1996, Pages 822-826

  Hong, Suk Kyoung ^a   Kim, Hyeong Joon ^a   Yang, Hong Geun ^b  

^a Seoul National University   (South Korea)

^b SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001674742     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.362891     Document Type: Article

References (11)

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