Etching of RuO2 and Pt thin films with ECR/RF reactor

Vacuum

Volumn 56, Issue 1, 2000, Pages 51-56

  Baborowski, J ^a   Muralt, P ^a   Ledermann, N ^a   Hiboux, S ^a  

^a EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC FILMS; FERROELECTRIC MATERIALS; ION BEAM LITHOGRAPHY; ION SOURCES; MASKS; MICROELECTRONIC PROCESSING; PHOTORESISTS; PLATINUM; RUTHENIUM COMPOUNDS; THIN FILMS;

RUTHENIUM OXIDE;

PLASMA ETCHING;

EID: 0033903506     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(99)00165-7     Document Type: Article

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