Modeling studies of the chemical vapor deposition of boron films from B2H6

Journal of Crystal Growth

Volumn 299, Issue 2, 2007, Pages 358-364

  Lamborn, Daniel R ^a   Snyder, David W ^b   Xi, X X ^b   Redwing, Joan M ^a,b  

^a The Pennsylvania State University   (United States)

^b PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

A1. Computer simulation; A1. Growth models; A3. Chemical vapor deposition processes; B1. Borates; B2. Superconducting materials

Indexed keywords

BORON COMPOUNDS; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; FLUID DYNAMICS; MAGNESIUM COMPOUNDS; SUPERCONDUCTING MATERIALS;

BORATES; GROWTH MODELS; SURFACE ADSORPTION;

THIN FILMS;

EID: 33846849232     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2006.11.253     Document Type: Article

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