Thickness dependence of the properties of epitaxial MgB2 thin films grown by hybrid physical-chemical vapor deposition

Applied Physics Letters

Volumn 82, Issue 24, 2003, Pages 4319-4321

  Pogrebnyakov, A V ^a   Redwing, J M ^a   Jones, J E ^a   Xi, X X ^a   Xu, S Y ^a   Li, Qi ^a   Vaithyanathan, V ^a   Schlom, D G ^a  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC RESISTANCE; EPITAXIAL GROWTH; FILM GROWTH; SUPERCONDUCTING FILMS; SUPERCONDUCTING TRANSITION TEMPERATURE; THICKNESS MEASUREMENT;

RESIDUAL RESISTIVITY;

THIN FILMS;

EID: 0038450109     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1583852     Document Type: Article

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