Investigation of Thin Film Growth of B12As2 by Chemical Vapor Deposition

Materials Research Society Symposium - Proceedings

Volumn 764, Issue , 2003, Pages 283-287

  Nagarajan, R ^a   Edgar, J H ^a   Pomeroy, J ^b   Kuball, M ^b   Aselage, T ^c  

^a Sunflower Networking Group   (United States)

^b UNIVERSITY OF BRISTOL   (United Kingdom)

^c SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BORON COMPOUNDS; CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; ENERGY GAP; FILM GROWTH; RAMAN SPECTROSCOPY; SILICON CARBIDE; SUBSTRATES; THERMAL EFFECTS; X RAY DIFFRACTION ANALYSIS;

BETA RADIATIONS; CRYSTAL QUALITY; DEPOSITION TEMPERATURES;

THIN FILMS;

EID: 0345359235     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)

1. J.L. Peret, J.Amer.Ceram. Soc., 47, 44 (1964).
2. R.A. Burmeister and P.E.Greene, Bull.Amer.Phys.Soc.Ser., 10, 1184 (1965).
3. B. Morosin, A. W. Mullendore, D. Emin, and G. A. Slack, in Boron-Rich Solids (AIP conf. Proc. No. 140), D.Emin, T.L.Aselage, C.L.Beckel, I.A.Howard and C.Wood, eds. (AIP, New York, 1986), pp. 70-86.
4. M. Hirayama and K.Shohno, Jpn.J.Appl.Phys, 12, 1960 (1973).
5. L.A.Correia, R.C. Van Oort, and P.J. Vander Put, Reactivity of Solids, 2, 203 (1986).
6. R.H.Wang, D. Zubia, T.O'neil, D. Emin, T.Aselage, W.Zhang and S.D.Hersee, J. Electron. Mater., 29, 1304 (2000).
7. T.L Aselage, D.R.Tallant and D.Emin, Phys. Rev. B 56, 3122 (1997).