A theoretical and experimental study of atomic-layer-deposited films onto porous dielectric substrates

Journal of Applied Physics

Volumn 98, Issue 8, 2005, Pages

  Travaiy, Y ^a   Schuhmacher, J ^a   Baklanov, M R ^a   Giangrandi, S ^a,b   Richard, O ^a   Brijs, B ^a   Van Hove, M ^a   Maex, K ^a,b   Abell, T ^a   Somers, K R F ^b   Hendrickx, M F A ^b   Vanquickenborne, L G ^b   Ceulemans, A ^b   Jonas, A M ^c  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

^c UNIVERSITÉ CATHOLIQUE DE LOUVAIN   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION (ALD); MOLECULAR MODELING; POROUS DIELECTRICS; SUBSTRATE POROSITY;

DEPOSITION; DIELECTRIC MATERIALS; FILM GROWTH; NUCLEATION; POROSITY; POROUS MATERIALS; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

METALLIC FILMS;

EID: 27744546811     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2108151     Document Type: Article

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