Modeling analysis of the MOCVD growth of ZnO film

Journal of Crystal Growth

Volumn 299, Issue 2, 2007, Pages 303-308

  Liu, S M ^a   Gu, S L ^a   Zhu, S M ^a   Ye, J D ^a   Liu, W ^a   Zhou, X ^a   Zhang, R ^a   Shi, Y ^a   Zheng, Y D ^a  

^a NANJING UNIVERSITY   (China)

Author keywords

A1. Computational simulation; A3. Metalorganic chemical vapor deposition; B2. ZnO

Indexed keywords

COMPUTER SIMULATION; FILM GROWTH; INTEGRATION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; ZINC OXIDE;

COMPUTATIONAL SIMULATION; DEPOSITION RATE; OPERATING PARAMETERS;

THIN FILMS;

EID: 33846786712     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2006.12.011     Document Type: Article

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