High-transmission attenuated phase-shift mask for ArF immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6349 II, Issue , 2006, Pages

  Kojima, Yosuke ^a   Mizoguchi, Takashi ^a   Haraguchi, Takashi ^a   Konishi, Toshio ^a   Okuda, Yoshimitsu ^a  

^a TOPPAN PRINTING CO LTD   (Japan)

Author keywords

3D EMF simulation; Attenuated phase shift mask; High transmission; Resolution enhancement technologies

Indexed keywords

COMPUTER SIMULATION; LIGHT POLARIZATION; LITHOGRAPHY; PHASE SHIFT;

3D-EMF SIMULATION; ATTENUATED PHASE-SHIFT MASK; RESOLUTION ENHANCEMENT TECHNOLOGIES;

LIGHT TRANSMISSION;

EID: 33846631917     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.686998     Document Type: Conference Paper

References (6)

1. W. Conley, N. Morgana, B. S. Kasprowicz, M. Cangemi, M. Lassiter, L. C. Litt, M. Cangemi, R. Cottle, W. Wu, J. Cobb, Y. M. Ham, K. Lucas, B. Roman, C. Progler, "High Transmission Mask Technology for 45 Node Imaging," Proc. of SPIE, vol.6154, 615411 (2006)
2. Y. M. Ham, N. Morgana, P. Sixt, M. Cangemi, B. Kasprowicz, C. Progler, P. Martin, "Optical properties and process impacts of high transmission EAPSM," Proc. of SPIE, vol.6154, 615413 (2006)
3. T. Mizoguchi, Y. Kojima, M. Takagi, T. Saga, T. Haraguchi, T. Konishi, Y. Fukushima, T. Tanaka, Y. Okuda, "Study of mask induced polarization effects on att.PSM in immersion lithography," Proc. SPIE, vol. 6283, 62831E (2006)
4. T. Adachi, Y. Inazuki, T. Sutou, Y. Kitahata, Y. Morikawa, N. Toyama, H. Mohri, N. Hayashi, "Lithographic performance comparison with various RET for 45-nm node with hyper NA," Proc. SPIE, vol. 6283, 62832W (2006)
5. S. Nemoto, T. Komizo, Y. Kikuchi, E. Gallagher, J. Benz, M. Hibbs, T. Haraguchi, "Evaluating Films for High Transmission Attenuated Phase Shift Masks," Proc. SPIE, vol. 6283, 628322 (2006)
6. A. Erdmann, G. Citarella, P. Evanschitzky, H. Schermer, V. Philipsen, P. D. Bisschop, "Validity of the Hopkins approximation in simulations of hyper NA (NA>1) line-space structures for an attenuated PSM mask," Proc. SPIE, vol. 6154, 61540G (2006)