Study of mask induced polarization effects on att.PSM in immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6283 I, Issue , 2006, Pages

  Mizoguchi, Takashi ^a   Kojima, Yousuke ^a   Takagi, Mikio ^a   Saga, Tadashi ^a   Haraguchi, Takashi ^a   Konishi, Toshio ^a   Fukushima, Yuuichi ^a   Tanaka, Tsuyoshi ^a   Okuda, Yoshimitsu ^a  

^a TOPPAN PRINTING CO LTD   (Japan)

Author keywords

att.PSM; Hyper NA; Immersion lithography; Polarization

Indexed keywords

LIGHT POLARIZATION; MONOLAYERS; PATTERN RECOGNITION; PHOTOLITHOGRAPHY; SEMICONDUCTOR DEVICES;

DEGREE OF POLARIZATION (DOP); HYPER NA; IMMERSION LITHOGRAPHY; POLARIZATION LITHOGRAPHY SYSTEM;

MASKS;

EID: 33748036403     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.681878     Document Type: Conference Paper

References (3)

1. A. Estroff, Y. Fan, A. Bourov and F. Cropanse, "Mask induced polarization effects at high NA", Microlithography 2005, Vol.5754, pp. 555-566, SPIE, San Jose, CA., 2005.
2. S. Teuber, K. Bubke, I. Hollein and R. Ziebold, J. H. Peters, "Determination of mask induced polarization effects occurring in Hyper NA immersion lithography", Microlithography 2005, Vol.5754, pp. 543-554, SPIE, San Jose, CA., 2005.
3. K. Bubke, S. Teuber, I. Hollein, H. Becker, H. Seitz and U. Buttgereit, "Investigation of polarization effects on new mask materials", Microlithography 2005, Vol.5754, pp. 587-598, SPIE, San Jose, CA., 2005.