High transmission mask technology for 45nm node imaging

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 I, Issue , 2006, Pages

  Conley, Will ^a   Morgana, Nicoló ^b   Kasprowicz, Bryan S ^c   Cangemi, Mike ^c   Lassiter, Matt ^b   Litt, Lloyd C ^a   Cangemi, Marc ^c   Cottle, Rand ^c   Wu, Wei ^a   Cobb, Jonathan ^a   Ham, Young Mog ^c   Lucas, Kevin ^a   Roman, Bernie ^a   Progler, Chris ^c  

^a FREESCALE SEMICONDUCTOR INC   (United States)

^b Photronics Inc   (France)

^c PHOTRONICS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; IMAGING TECHNIQUES; LIGHT POLARIZATION; PHOTOLITHOGRAPHY; SEMICONDUCTING FILMS; WSI CIRCUITS; LITHOGRAPHY; POLARIZATION; RELIABILITY;

HIGH TRANSMISSION MASK TECHNOLOGY; IMMERSION EFFECTS; MASK TOPOGRAPHY; IMMERSION SCANNERS; NODE IMAGING;

MASKS;

EID: 33745804709     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.659353     Document Type: Conference Paper

References (12)

1. "TiSi-nitride attenuatuing phase shift photomask for 193-nm lithography" Reynolds et al. Bacus Photomask 1998
2. "High transmittance attenuated phase shifting mask of chromium aluminum oxynitride" Choi et al. Bacus Photomask 2002
3. "Advanced 193 tri-tone EAPSM (9%-18%) for 65 nm node" Dieu et al. Bacus Photomask 2002
4. "Development of attenuating PSM shifter for F2 and high-transmission ArF lithography" Nozawa et al. SPIE Optical Microlithography 2003
5. "Performance data on new tunable attenuating PSM for 193-nm and 157-nm lithography" Becker et al. SPIE Optical Microlithography 2004
6. "New structure of ArF high-transmittance attenuated phase-shifting mask with dry etching process" Iso et al. Bacus Photomask 2004
7. "Evaluation of molybdenum silicide for use as a 193-nm phase-shifting absorber in photomask manufacturing" Hibbs et al. Bacus Photomask 2001
8. "Tunable transmission phase mask options for 65/45nm node gate and contact processing" Kasprowicz et al. SPIE Optical Microlithography 2005
9. "RET masks for the final frontier of optical lithography" Chen et al. SPIE Optical Microlithography 2005
10. "High transmission mask technology for 45nm node imaging," W. Conley, B.S. Kasprowicz, et al. SPIE Optical Microlithography 2005
11. "Imaging performance of various PSM technology for the 45nm node using immersion and polarization lithography," E. Poortinga et al. BACUS Photomask 2005
12. "Optical properties and process impacts of high-transmission EAPSM in high-NA ArF lithography," Y. Ham et al. SPIE Optical Microlithography to be published February 2006