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Volumn 253, Issue 8, 2007, Pages 4041-4044

Effect of thermal annealing on microstructural properties of Ti/Ge 2 Sb 2 Te 5 /Ti thin films deposited on SiO 2 /Si substrates by a sputtering method

Author keywords

Diffusion; Ge 2 Sb 2 Te 5; Transmission electron microscopy

Indexed keywords

ANNEALING; AUGER ELECTRON SPECTROSCOPY; MICROSTRUCTURE; SPUTTERING; SUBSTRATES; THERMAL EFFECTS; TRANSMISSION ELECTRON MICROSCOPY;

EID: 33846587452     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.08.038     Document Type: Article
Times cited : (9)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.