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Volumn 253, Issue 8, 2007, Pages 4041-4044
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Effect of thermal annealing on microstructural properties of Ti/Ge 2 Sb 2 Te 5 /Ti thin films deposited on SiO 2 /Si substrates by a sputtering method
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Author keywords
Diffusion; Ge 2 Sb 2 Te 5; Transmission electron microscopy
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Indexed keywords
ANNEALING;
AUGER ELECTRON SPECTROSCOPY;
MICROSTRUCTURE;
SPUTTERING;
SUBSTRATES;
THERMAL EFFECTS;
TRANSMISSION ELECTRON MICROSCOPY;
INTERMIXING LAYERS;
MICROSTRUCTURAL PROPERTIES;
THERMAL ANNEALING;
THIN FILMS;
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EID: 33846587452
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/j.apsusc.2006.08.038 Document Type: Article |
Times cited : (9)
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References (16)
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