Sub-0.1 μm patterning with high aspect ratio of 5 achieved by preventing pattern collapse

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 4 A, 1996, Pages 2385-2386

  Yamashita, Yoshio ^a,b  

^a SORTEC Corporation   (Japan)

^b OKI ELECTRIC INDUSTRY CO   (Japan)

Author keywords

Pattern collapse; Perfluoro compound; Replication; Submicron; Surface tension; X ray lithography

Indexed keywords

ASPECT RATIO; FAILURE ANALYSIS; FLUORINE COMPOUNDS; INTEGRATED CIRCUIT MANUFACTURE; ION BEAMS; MASKS; ORGANIC SOLVENTS; SURFACE TENSION; SYNCHROTRON RADIATION; WATER; X RAY LITHOGRAPHY;

LOW SURFACE TENSION RINSER; OPTICAL LITHOGRAPHIES; PATTERN COLLAPSE; PATTERNING; PERFLUOROHEXANE; PROXIMITY GAP; REPLICATION; SUBMICRON; SYNCHROTRON RADIATION RING;

LITHOGRAPHY;

EID: 0030121816     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.2385     Document Type: Article

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