Characterization of single crystal silicon and electroplated nickel films by uniaxial tensile test with in situ X-ray diffraction measurement

Fatigue and Fracture of Engineering Materials and Structures

Volumn 30, Issue 1, 2007, Pages 13-20

  Namazu, T ^a   Inoue, S ^a  

^a UNIVERSITY OF HYOGO   (Japan)

Author keywords

Electroplated nickel; Out of plane elastic strain; Poisson's ratio; Single crystal silicon; Size effect; XRD tensile test; Young's modulus

Indexed keywords

BRITTLE FRACTURE; ELASTIC MODULI; ELECTROPLATED PRODUCTS; FILMS; NICKEL; POISSON RATIO; SEMICONDUCTING SILICON; SINGLE CRYSTALS; TENSILE STRENGTH; X RAY DIFFRACTION ANALYSIS;

ELECTROPLATED NICKEL FILMS; SINGLE CRYSTAL SILICON; X-RAY DIFFRACTION TENSILE TESTING;

TENSILE TESTING;

EID: 33846269362     PISSN: 8756758X     EISSN: 14602695     Source Type: Journal    
DOI: 10.1111/j.1460-2695.2006.01043.x     Document Type: Article

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