Sub-20-nm alignment in nanoimprint lithography using moiré fringe

Nano Letters

Volumn 6, Issue 11, 2006, Pages 2626-2629

  Li, Nianhua ^a   Wu, Wei ^a   Chou, Stephen Y ^a  

^a Princeton University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

NANOIMPRINT LITHOGRAPHY (NIL); PRECISION TEMPERATURE CONTROL; WAFER-MOLD MISMATCH COMPENSATION;

DIFFRACTION GRATINGS; ERROR DETECTION; INTEGRATED CIRCUIT MANUFACTURE; MULTILAYERS; SIGNAL PROCESSING; TEMPERATURE CONTROL;

LITHOGRAPHY;

NANOPARTICLE;

ARTICLE; CHEMISTRY; INTERFEROMETRY; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; SENSITIVITY AND SPECIFICITY;

MOIRE TOPOGRAPHY; NANOPARTICLES; NANOTECHNOLOGY; PARTICLE SIZE; SENSITIVITY AND SPECIFICITY;

EID: 33846225236     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl0603395     Document Type: Article

References (19)

1. Chou, S. Y.; Krauss, P. R.; Renstrom, P. J. Appl. Phys. Lett. 1995, 67, 3114-3116.
2. Austin, M. D.; Zhang, W.; Ge, H. X.; Wasserman, D.; Lyon, S. A.; Chou, S. Y. Nanotechnology 2005, 16, 1058-1061.
3. Zhang, W.; Chou, S. Y. Appl. Phys. Lett. 2003, 83, 1632-1634.
4. Martini, I.; Dechow, J.; Kamp, M.; Forchel, A.; Koeth, J. Microelectron. Eng. 2002, 60, 451-455.
5. Guo, L. J.; Krauss, P. R.; Chou, S. Y. Appl. Phys. Lett. 1997, 71, 1881-1883.
6. Austin, M. D.; Chou, S. Y. Appl. Phys. Lett. 2002, 81, 4431-4433.
7. McAlpine, M. C; Friedman, R. S.; Lieber, D. M. Nano Lett. 2003, 3, 443-445 APR 2003.
8. Austin, M. D.; Ge, H.; Wu, W.; Wasserman, D.; Lyon, S.; Chou, S. Y. Fabrication of 5 nm line width and 14 nm pitch features by nanoimprint lithography. In Second International Conference on Nanoimprint and Nanoprint Technology.
9. Alkaisi, M. M.; Jayatissa, W.; Konijn, M. Curr. Appl. Phys. 2004, 4, 111-114.
10. Fuchs, A.; Vratzov, B.; Wahlbrink, T.; Georgiev, Y.; Kurz, H. J. Vac. Sci. Technol., B 2004, 22, 3242-3245.
11. Wittekoek, S.; van den Brink, M.; Linders, H.; Stoeldrayer, J.; Martens, J. W. D.; Ritchie, D. 534 SPIE Vol. 1264 Optical/Laser Microlithography III, 1990.
12. Flanders, D. C.; Smith, H.; Austin, S. Appl. Phys. Lett. 1977, 31, 426-428.
13. Uchida, Y.; Hattori, S.; Nomura, T. J. Vac. Sci. Technol., B 1987, 5, 244-247.
14. Murnane, M. R.; Raymond, C. J.; Hatab, Z. R.; Naqvi, S. S. H.; McNeil, J. R. Proc. SPIE 1994, 2196, 47.
15. Moel, A.; Moon, E. E.; Frankel, R. D.; Smith, H. I. J. Vac. Sci. Techonol., B 1993, 11, 2191-2194.
16. Moon, E. E.; Everett, P. H.; Smith, H. I. J. Vac. Sci. Technol., B 1995, 13, 2648-2652.
17. Zhou, H.; Feldman, M.; Bass, R. J. Vac. Sci. Technol., B 1994, 12, 3261-3264.
18. Chen, G.; Wallace, J. P.; Cerrina, F. Jpn. J. Appl. Phys., Part 1 1993, 52, 5977-5981.
19. Chou, S. Y. Nanoimprint lithography. U.S. Patent 5,772,905, 1998.