Molecular dynamics study on Ar ion bombardment effects in amorphous SiO2 deposition processes

Journal of Applied Physics

Volumn 100, Issue 12, 2006, Pages

  Taguchi, Masafumi ^a,b   Hamaguchi, Satoshi ^b  

^a NIPPON SHEET GLASS CO LTD   (Japan)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ARGON; COMPUTER SIMULATION; ION BOMBARDMENT; MOLECULAR DYNAMICS; MONTE CARLO METHODS; SPUTTER DEPOSITION;

AR BOMBARDMENT; ARGON ION BOMBARDMENT; REACTIVE SPUTTERING DEPOSITION; SI O2 FILMS;

SILICON COMPOUNDS;

EID: 33846106803     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2401651     Document Type: Article

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