Blazed diffraction gratings fabricated using X-ray lithography: Fabrication, modeling and simulation

Microelectronics Reliability

Volumn 43, Issue 2, 2003, Pages 249-258

  Hagouel, Paul Isaac ^a  

^a Optelec   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; LITHOGRAPHY; MONOCHROMATORS; OPTICAL COMMUNICATION; REFLECTION; SCANNING; SPECTROSCOPIC ANALYSIS; X RAY ANALYSIS;

OPTICAL SCANNERS;

DIFFRACTION GRATINGS;

EID: 0037302706     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2714(02)00265-2     Document Type: Conference Paper

References (21)

1. Sommerfeld A. Optics. 1954;Academic Press, New York, NY.
2. Landau L.D., Lifshitz E.M. The classical theory of fields. 3rd ed. 1971;Addison-Wesley, Reading, MA.
3. Jenkins F., White H. Fundamentals of optics. 4th ed. 1976;McGraw-Hill, New York, NY.
4. Jones D.S. The theory of electromagnetism. 1964;Pergamon, Oxford, UK.
5. Optics tutorial - diffraction gratings ruled and holographic, Jobin Yvon-Horiba, UK, 2002.
6. Chen C, Fleming RC, Hindle P, McGuirk M, Murphy E, (Schattenburg ML, Canizares CR, Smith HI). Super-smooth X-ray reflection gratings. Submicron and nanometer structures report. Massachusetts Institute of Technology, Cambridge, MA, 1999. p. 139-40.
7. Fleming RC, Heilmann R, Murphy E, (Schattenburg ML, Canizares CR, Smith HI). Super-smooth X-ray reflection gratings. Space nanotechnology laboratory progress report. Center for Space Research, Massachusetts Institute of Technology, Cambridge, MA, 2001. p.14-6.
8. Rossi B.B. Optics. 1957;Addison-Wesley, Reading, MA.
9. Goldstein H. Classical mechanics. 1965;Addison-Wesley, Reading, MA.
10. Arnold V. Méthodes Mathématiques de la Mécanique Classique. 1976;Mir, Moscow, Russia.
11. Hagouel PI, Neureuther AR. Modeling of X-ray resists for high resolution lithography. In: 170th Meeting, American Chemical Society, Organic Coatings and Plastics, Preprints, Chicago, IL, vol. 35, no. 2, 1975. p. 298-305.
12. Jewett R.E., Hagouel P.I., Neureuther A.R., VanDuzer T. Line profile resist development simulation techniques. Polym. Eng. Sci. 17(6):1977;381-384.
13. Tassopoulos N., Hagouel P.I., Kriezis E.E. Modeling and simulation of anisotropic etching. Proceedings of the Microcircuit Engineering 83 Conference, Cambridge, England, Microcircuit Engineering 1983. 1983;421-426 Academic Press, London.
14. Karafyllidis I., Hagouel P. Simulation of multiple etch fronts. Microelectron. J. 22:1991;97-104.
15. Karafyllidis I., Thanailakis A. Simulation of two-dimensional photoresist etching process in integrated circuit fabrication using cellular automata. Model. Simul. Mater. Sci. Eng. 3:1995;629-642.
16. Hagouel P.I.L., Neureuther A.R., Zenk A.M. Negative resist corner rounding. Envelope volume modeling. J. Vac. Sci. Technol. B (Microelectron. Nanometer Struct.). 14(6):1996;4257-4261.
17. Hagouel P.I., Karafyllidis I., Neureuther A.R. Developer temperature effect on negative deep ultraviolet resists: characterization, modeling and simulation. J. Vac. Sci. Technol. B (Microelectron. Nanometer Struct.). 15(6):1997;2616-2620.
18. Hagouel P.I., Karafyllidis I., Neureuther A.R. Dependence of developed negative resist profiles on exposure energy dose: experiment, modeling and simulation. Microelectron. Eng. 41/42:1998;351-354.
19. Karafyllidis I., Hagouel P.I., Neureuther A.R. Negative resist profiles of close-spaced parallel and isolated lines: experiment modelling and simulation. Microelectron. Eng. 45:1999;71-84.
20. Karafyllidis I., Hagouel P.I., Thanailakis A., Neureuther A.R. An efficient photoresist development simulator based on cellular automata with experimental verification. IEEE Trans. Semicond. Manuf. 13(1):2000;61-75.
21. Cole D.C., Barouch E., Conrad E.W., Yeung M. Using advanced simulation to aid microlithography development. Proc. IEEE. 89(1):2001;1194-1213.