High-quality thin-film passivation by catalyzer-enhanced chemical vapor deposition for organic light-emitting diodes

Applied Physics Letters

Volumn 90, Issue 1, 2007, Pages

  Kim, Han Ki ^a   Kim, Myung Soo ^b   Kang, Jae Wook ^c   Kim, Jang Joo ^c   Yi, Min Su ^d  

^a Kumoh National Institute of Technology   (South Korea)

^b Samsung SDI   (South Korea)

^c Seoul National University   (South Korea)

^d Kyungpook National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYSIS; CHEMICAL VAPOR DEPOSITION; CURRENT VOLTAGE CHARACTERISTICS; PASSIVATION; POLYCARBONATES; THIN FILMS;

ORGANIC LIGHT-EMITTING DIODES (OLED); THIN-FILM PASSIVATION; TUNGSTEN CATALYZER;

LIGHT EMITTING DIODES;

EID: 33846091136     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2425021     Document Type: Article

References (15)

1. C. W. Tang and S. A. VanSlyk, Appl. Phys. Lett. 51, 913 (1987).
2. P. E. Burrows, V. Bulovic, S. R. Forrest, L. S. Sapochak, D. M. McCarty, and M. E. Thompson, Appl. Phys. Lett. 65, 2922 (1994).
3. H. Aziz, Z. Popovic, S. Xie, A.-M. Hor, N.-X. Hu, C. Tripp, and G. Xu, Appl. Phys. Lett. 72, 756 (1998).
4. W. Huang, X. Wang, M. Sheng, L. Xu, F. Stubhan, L. Luo, T. Feng, X. Wang, F. Zhang, and S. Zou, Mater. Sci. Eng., B B98, 248 (2003).
5. A. B. Chwang, M. A. Rothman, S. Y. Mao, R. H. Hewitt, X. Chu, L. Moro, T. Trajewski, and N. Rutherford, Appl. Phys. Lett. 83, 413 (2003).
6. M. Schaepkens, T. W. Kim, A. G. Erlat, M. Yan, K. W. Flanagan, C. M. Heller, and P. A. McConnelee, J. Vac. Sci. Technol. A 22, 1716 (2004).
7. H. Kubota, S. Miyaguchi, S. Ishizuka, T. Wakimoto, Y. Fukuda, T. Watanabe, H. Ochi, T. Sakamoto, T. Miyake, M. Tsuchida, I. Ohshita, and T. Tohma, J. Lumin. 87, 56 (2000).
8. S. J. Yun, Y.-W. Ko, and J. W. Lim, Appl. Phys. Lett. 85, 4896 (2004).
9. M. S. Weaver, L. A. Michalski, K. Rajan, M. A. Rothman, J. A. Silvernail, P. E. Burrows, G. L. Graff, M. E. Gross, P. M. Martin, M. Hall, E. Mast, C. Bonham, W. Bennett, and M. Zumhoff, Appl. Phys. Lett. 81, 2929 (2002).
10. H.-K. Kim, D.-G. Kim, K.-S. Lee, M.-S. Huh, S. H. Jeong, and K. I. Kim, Appl. Phys. Lett. 86, 183503 (2005).
11. H. Matsumura, Jpn. J. Appl. Phys., Part 1 37, 3175 (1998).
12. A. Matsuda, Thin Solid Films 337, 1 (1999).
13. T. Minamikawa, A. Heya, T. Niki, M. Takano, Y. Yonezawa, S. Muroi, S. Minami, A. Masuda, H. Umemoto, and H. Matsumura, Thin Solid Films 501, 154 (2006).
14. H.-K. Kim, Nucl. Instrum. Methods Phys. Res. B 253, 255 (2006).
15. A. P. Roberts, B. M. Henry, A. P. Sutton, C. R. M. Grovenor, G. A. D. Briggs, T. Miyamoto, M. Kano, Y. Tsukahara, and M. Yanaka, J. Membr. Sci. 208, 75 (2002).