Influence of electron-beam and ultraviolet treatments on low- k porous dielectrics

Journal of Applied Physics

Volumn 100, Issue 12, 2006, Pages

  Martinez, E ^a   Rochat, N ^a   Guedj, C ^a   Licitra, C ^a   Imbert, G ^b   Le Friec, Y ^b  

^a CEA LETI   (France)

^b STMICROELECTRONICS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CAPACITANCE; CROSSLINKING; ELECTRIC RESISTANCE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MOS DEVICES; POROUS MATERIALS; TRANSISTORS; ULTRAVIOLET RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

ORGANIC PHASE (POROGEN); POROUS DIELECTRICS; RESISTANCE-CAPACITANCE DELAY; ULTRAVIOLET TREATMENTS;

DIELECTRIC MATERIALS;

EID: 33846070611     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2401055     Document Type: Article

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