Nanoscale surface roughening in ultrathin aluminum films

Journal of Applied Physics

Volumn 100, Issue 11, 2006, Pages

  Aurongzeb, D ^a   Washington, E ^a   Basavaraj, M ^a   Berg, J M ^a   Temkin, H ^a   Holtz, M ^a  

^a TEXAS TECH UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; GLASS; NANOSTRUCTURED MATERIALS; SUBSTRATES; SURFACE ROUGHNESS; THICK FILMS;

ALUMINUM FILMS; SCALING BEHAVIOR; STRESS-ENERGY MINIMIZATION;

ULTRATHIN FILMS;

EID: 33845727576     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2365388     Document Type: Article

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