Roughening kinetics of thin films in the presence of both stress and Ehrlich-Schwobel barrier

Applied Physics Letters

Volumn 83, Issue 26, 2003, Pages 5404-5406

  Liu, Z J ^a   Shen, Y G ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ATOMIC PHYSICS; DIFFUSION; ELASTIC MODULI; EVAPORATION; FILM GROWTH; FOURIER TRANSFORMS; HIGH TEMPERATURE EFFECTS; KINETIC THEORY; MORPHOLOGY; SHOT NOISE; STRAIN; STRESS ANALYSIS; SURFACE ROUGHNESS;

ELASTIC CONSTANTS; NOISE VARIANCE ANALYSIS; SCALING LAW;

THIN FILMS;

EID: 0942288655     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1637448     Document Type: Article

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