Area-selective deposition of self-assembled monolayers on Si O 2/Si(100) patterns

Applied Physics Letters

Volumn 89, Issue 23, 2006, Pages

  Wang, Changshun ^a   Pan, Xu ^a   Sun, Cunying ^a   Urisu, Tsuneo ^b  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

^b INSTITUTE FOR MOLECULAR SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CONTACT ANGLE; DEPOSITION; INFRARED SPECTROSCOPY; SELF ASSEMBLY; SILICA; SYNCHROTRON RADIATION;

CONTACT ANGLE MEASUREMENTS; OCTADECYLTRICHLOROSILANE; SELF-ASSEMBLED MONOLAYERS (SAM);

MONOLAYERS;

EID: 33845404360     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2400114     Document Type: Article

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