Photolithographic patterning of dendrimer monolayers and pattern-selective adsorption of linear macromolecules

Journal of Nanoscience and Nanotechnology

Volumn 5, Issue 11, 2005, Pages 1792-1800

  Yamazaki, Tomoko ^a   Imae, Toyoko ^a   Sugimura, Hiroyuki ^b   Saito, Nagahiro ^a   Hayashi, Kazuyuki ^c   Takai, Osamu ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b KYOTO UNIVERSITY   (Japan)

^c ASAHI GLASS CO LTD   (Japan)

Author keywords

Atomic force microscopy; Dendrimer; n octadecyltrimethoxysilane; Photolithographic pattering; Photolithography; Poly(amido amine) dendrimer; Poly(propyleneimine) dendrimer; Self assembled monolayer; Surface enhanced infrared absorption spectroscopy

Indexed keywords

N OCTADECYLTRIMETHOXYSILANE; PHOTOLITHOGRAPHIC PATTERING; POLY(AMIDO AMINE) DENDRIMERS; POLY(PROPYLENEIMINE) DENDRIMERS; SELF-ASSEMBLED MONOLAYERS; SURFACE ENHANCED INFRARED ABSORPTION SPECTROSCOPY;

ADSORPTION; ATOMIC FORCE MICROSCOPY; DENDRIMERS; ESTERIFICATION; OXIDATION; PARAFFINS; PHOTOLITHOGRAPHY;

MACROMOLECULES;

AMINE; BIOMATERIAL; DNA; HYALURONIC ACID; N OCTADECYLTRIMETHOXYSILANE; N-OCTADECYLTRIMETHOXYSILANE; ORGANOSILICON DERIVATIVE; PAMAM STARBURST; POLYAMINE; POLYGLUTAMIC ACID; POLYMER; SILICON;

ADSORPTION; ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; CONFORMATION; ELECTROCHEMISTRY; HYDROGEN BOND; MACROMOLECULE; PH; SPECTROPHOTOMETRY; SURFACE PROPERTY; ULTRAVIOLET RADIATION;

ADSORPTION; AMINES; BIOCOMPATIBLE MATERIALS; DNA; ELECTROCHEMISTRY; HYALURONIC ACID; HYDROGEN BONDING; HYDROGEN-ION CONCENTRATION; MACROMOLECULAR SUBSTANCES; MICROSCOPY, ATOMIC FORCE; NUCLEIC ACID CONFORMATION; ORGANOSILICON COMPOUNDS; POLYAMINES; POLYGLUTAMIC ACID; POLYMERS; SILICON; SPECTROPHOTOMETRY; SURFACE PROPERTIES; ULTRAVIOLET RAYS;

EID: 33646142308     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2005.434     Document Type: Article

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