Tungsten contamination in BF2 implants

Proceedings of the International Conference on Ion Implantation Technology

Volumn , Issue , 1996, Pages 135-138

  Liebert, Reuel B ^a   Angel, Gordon C ^a   Kase, Masataka ^a  

^a VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARSENIC; ATOMS; BORON COMPOUNDS; CONTAMINATION; DECOMPOSITION; IMPURITIES; ISOTOPES; MOLECULAR DYNAMICS; SECONDARY ION MASS SPECTROMETRY; TUNGSTEN;

BORON FLUORIDE IMPLANTS; ISOTOPIC RATIOS;

ION IMPLANTATION;

EID: 0030350947     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)