Gas cluster ion beams for wafer processing

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 237, Issue 1-2, 2005, Pages 235-239

  Mack, M E ^a  

^a Epion Corporation   (United States)

Author keywords

Cluster ion beams; Equipment for GCIB; GCIB

Indexed keywords

ARGON; BORON; DATA ACQUISITION; DEPOSITION; ETCHING; GERMANIUM; PRODUCTION; RELIABILITY; SEMICONDUCTOR DOPING; SILICON WAFERS;

CLUSTER ION BEAMS; EQUIPMENT FOR GCIB; GCIB; WAFER PROCESSING;

ION BEAMS;

EID: 23444449501     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2004.12.139     Document Type: Conference Paper

References (8)

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