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Volumn 9, Issue 3, 2003, Pages 12-15
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Ion implantation in silicon technology
a
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Author keywords
[No Author keywords available]
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Indexed keywords
DOPING;
HIGH VOLTAGE ENGINNERING CORP. (HVEC);
ION IMPLANTERS;
SILICON TECHNOLOGY;
ANNEALING;
APPROXIMATION THEORY;
CHEMICAL VAPOR DEPOSITION;
CMOS INTEGRATED CIRCUITS;
COSTS;
ION BEAMS;
MICROPROCESSOR CHIPS;
PATENTS AND INVENTIONS;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON WAFERS;
SPATIAL VARIABLES MEASUREMENT;
ION IMPLANTATION;
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EID: 1442270344
PISSN: 10821848
EISSN: None
Source Type: Journal
DOI: None Document Type: Review |
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Times cited : (55)
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References (0)
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