Uniformity of PZT thin films prepared by MOCVD on 8"Φ substrate

Integrated Ferroelectrics

Volumn 46, Issue , 2002, Pages 65-77

  Masuda, Takeshi ^a   Kajinuma, Masahiko ^a   Yamada, Takakazu ^a   Uchida, Hiroto ^a   Uematsu, Masaki ^a   Suu, Koukou ^a   Ishikawa, Michio ^a  

^a ULVAC INC   (Japan)

Author keywords

Compositional control; Ferroelectric thin film; MOCVD; PZT; Uniformity

Indexed keywords

COMPUTER HARDWARE; DEPOSITION; FERROELECTRICITY; LEAD COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING LEAD COMPOUNDS;

COMPOSITIONAL CONTROL; GAS FLOW CONTROL; HARDWARE CONSTRUCTION; UNIFORMITY;

FERROELECTRIC THIN FILMS;

EID: 33751294012     PISSN: 10584587     EISSN: 16078489     Source Type: Conference Proceeding    
DOI: 10.1080/10584580215388     Document Type: Article

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