Lead content control of PLZT thin films prepared by RF magnetron sputtering

Integrated Ferroelectrics

Volumn 14, Issue 1-4, 1997, Pages 59-68

  Suu, K ^a   Osawa, A ^a   Tani, N ^a   Ishikawa, M ^a   Nakamura, K ^a   Ozawa, T ^b   Sameshima, K ^b   Kamisawa, A ^b   Takasu, H ^b  

^a ULVAC INC   (Japan)

^b ROHM CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; LEAD COMPOUNDS; LOW TEMPERATURE OPERATIONS; MAGNETRON SPUTTERING; PLATINUM COMPOUNDS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

MULTICHAMBER TYPE PRODUCTION SYSTEMS;

DIELECTRIC FILMS;

EID: 0031361456     PISSN: 10584587     EISSN: None     Source Type: Journal    
DOI: 10.1080/10584589708019977     Document Type: Article

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