Coating materials of TiN, Ti-Al-N, and Ti-Si-N by plasma-enhanced chemical vapor deposition for mechanical applications

Journal of Materials Processing Technology

Volumn 130-131, Issue , 2002, Pages 254-259

  Park, In Wook ^a   Kim, Kwang Ho ^a  

^a Pusan National University   (South Korea)

Author keywords

Micro hardness; Oxidation; PECVD; Ti Al N; Ti Si N; TiN

Indexed keywords

COATINGS; GRAIN SIZE AND SHAPE; MICROHARDNESS; OXIDATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; STEEL;

COATING MATERIALS;

TITANIUM ALLOYS;

EID: 0037146963     PISSN: 09240136     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-0136(02)00807-5     Document Type: Conference Paper

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