Nitrogen ion implantation of silicon in dense plasma focus

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 252, Issue 2, 2006, Pages 219-224

  Sadiq, Mehboob ^a   Ahmad, S ^a   Shafiq, M ^a   Zakaullah, M ^a  

^a QUAID I AZAM UNIVERSITY   (Pakistan)

Author keywords

Dense plasma focus; Ion implantation; Raman spectroscopy; Silicon nitride (Si3N4); X ray diffraction (XRD)

Indexed keywords

AMORPHOUS SILICON; PLASMAS; RAMAN SPECTROSCOPY; SILICON NITRIDE; X RAY DIFFRACTION;

ARGON AMBIENT TRANSFORMS; DENSE PLASMA FOCUS; IMPLANTATION DOSE; MICRO-CRYSTALLINE PHASE;

ION IMPLANTATION;

EID: 33751101902     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2006.08.020     Document Type: Article

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