2D InP photonic crystal fabrication process development

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6327, Issue , 2006, Pages

  Rong, Bifeng ^a   Van Der Drift, Emile ^a   Van Der Heijden, Rob W ^b   Salemink, Huub W M ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

2D photonic crystal; Cl 2+N2 plasma; Gratings; High aspect ratio; Hole and pillar; III V photonic crystal; InP nanophotonic crystal; Nanofabrication; Nanophotonic crystal; Nanophotonics; Nanotechnology

Indexed keywords

ASPECT RATIO; DIELECTRIC PROPERTIES; DIFFRACTION GRATINGS; LIGHT TRANSMISSION; NANOTECHNOLOGY; PHOTONS; PLASMA APPLICATIONS; SINGLE CRYSTALS;

2D PHOTONIC CRYSTAL; HIGH ASPECT RATIO; III-V PHOTONIC CRYSTAL; INP NANOPHOTONIC CRYSTAL; NANOPHOTONIC CRYSTAL; NANOPHOTONICS;

INDIUM COMPOUNDS;

EID: 33751085680     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.680281     Document Type: Conference Paper

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