Bromine ion-beam-assisted etching of InP and GaAs

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 3, 1998, Pages 1012-1017

  Rossler, J M ^a   Royter, Y ^b   Mull, D E ^c   Goodhue, W D ^a,c   Fonstad, C G ^b  

^a University of Massachusetts Lowell   (United States)

^b USA   (United States)

^c MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0004268660     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590060     Document Type: Article

References (8)

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7. Vapor pressure data from the American Institute of Physics Handbook, 3rd ed. (McGraw-Hill, New York, 1989), Sec. 4K.
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