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Volumn 20, Issue 1, 2002, Pages 105-108
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Investigation of macroscopic uniformity during CH4/H2 reactive ion etching of InP and its improvement, by use of a guard ring
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Author keywords
[No Author keywords available]
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Indexed keywords
CATHODES;
MASKS;
MATHEMATICAL MODELS;
PLASMAS;
REACTIVE ION ETCHING;
SEMICONDUCTING INDIUM PHOSPHIDE;
SILICON WAFERS;
SURFACE ACTIVE AGENTS;
GUARD RING;
SEMICONDUCTOR DEVICE MANUFACTURE;
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EID: 0036120824
PISSN: 10711023
EISSN: None
Source Type: Journal
DOI: 10.1116/1.1428276 Document Type: Conference Paper |
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Times cited : (5)
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References (5)
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