IC1 plasma etching of III-V semiconductors

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 3, 1997, Pages 652-656

  Lee, J W ^a   Hong, J ^a   Lambers, E S ^a   Pearton, S J ^a  

^a UNIVERSITY OF FLORIDA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002120662     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589308     Document Type: Article

References (19)

1. See for example, S. J. Pearton, Int. J. Mod. Phys. B 8, 1781 (1994).
2. G. F. Doughty, S. Thorns, V. Law, and C. D. W. Wilkinson, Vacuum 36, 803 (1986).
3. D. L. Flamm and V. M. Donnelly, Plasma Chem. Plasma Process. 1, 317 (1981).
4. L. A. Coldren and J. A. Rentschler, J. Vac. Sci. Technol. 19, 225 (1981).
5. U. Niggebrugge, M. Klug, and G. Garus, Inst. Phys. Conf. Ser. 79, 367 (1985).
6. T. R. Hayes, in InP and Related Materials-Processing, Technology and Devices, edited by A. Katz (Artech House, Boston, 1992), Chap. 8.
7. S. J. Pearton, in Handbook of Compound Semiconductors, edited by P. H. Holloway and G. E. McGuire (Noyes, Park Ridge, NJ, 1995), Chap. 8.
8. D. L. Melville, J. G. Simmons, and D. A. Thompson, J. Vac. Sci. Technol. B 11, 2038 (1993).
9. N. G. Chew and A. G. Cullis, Appl. Phys. Lett. 44, 142 (1984).
10. C. W. Krueger, C. A. Wang, and M. F. Stephanopoulos, Appl. Phys. Lett. 60, 159 (1992).
11. D. C. Flanders, L. D. Pressman, and G. Pinelli, J. Vac. Sci. Technol. B 8, 1990 (1990).
12. S. J. Pearton, U. K. Chakrabartum, A. Katz, F. Ren, and T. R. Fullowan, Appl. Phys. Lett. 62, 2411 (1992).
13. IC1 obtained from Alfa AESAR (Johnson Matthey).
14. R. W. B. Pearce and A. G. Gaydon, The Identification of Molecular Spectra (Chapman and Hall, London, 1976).
15. S. Salimian, C. B. Cooper III, and M. E. Day, J. Vac. Sci. Technol. B 5, 1606 (1987).
16. R. Khare, J. Brown, M. Hu, D. Pierson, M. Melendes, and C. Constantine, J. Vac. Sci. Technol. B 12, 2947 (1994).
17. R. J. Shul, R. P. Schneider, and C. Constantine, Electron. Lett. 30, 817 (1994).
18. K. Y. Hur, B. J. Guerin, and T. E. Kazior, J. Vac. Sci. Technol. B 12, 1410 (1994).
19. S. J. Pearton, U. K. Chakrabarti, A. P. Perley, and K. S. Jones, J. Appl. Phys. 68, 2760 (1990).