Selective etching of metallic carbon nanotubes by gas-phase reaction

Science

Volumn 314, Issue 5801, 2006, Pages 974-977

  Zhang, Guangyu ^a   Qi, Pengfei ^a   Wang, Xinran ^a   Lu, Yuerui ^a   Li, Xiaolin ^a   Tu, Ryan ^a   Bangsaruntip, Sarunya ^a   Mann, David ^a   Zhang, Li ^a   Dai, Hongjie ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBONATION; INTEGRATED CIRCUITS; PLASMA ETCHING; REACTION KINETICS;

GAS PHASE REACTION; HYDROCARBONATION; METALLICITY; PRISTINE;

CARBON NANOTUBES;

CARBON NANOTUBE; HYDROCARBON; METAL DERIVATIVE;

CARBON; ETCHING; METAL; PLASMA;

ARTICLE; CHEMICAL ANALYSIS; CHEMICAL REACTION; GAS; INTEGRATED CIRCUIT; MATERIALS; MATERIALS TESTING; NANOTECHNOLOGY; PRIORITY JOURNAL; SEMICONDUCTOR;

EID: 33751000466     PISSN: 00368075     EISSN: 10959203     Source Type: Journal    
DOI: 10.1126/science.1133781     Document Type: Article

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