Mechanical properties of a-C:H and a-C:H/SiOx nanocomposite thin films prepared by ion-assisted plasma-enhanced chemical vapor deposition

Thin Solid Films

Volumn 280, Issue 1-2, 1996, Pages 204-210

  Lee, Jung H ^a   Kim, Dong S ^a   Lee, Young H ^a   Farouk, Bakhtier ^a  

^a Drexel University   (United States)

Author keywords

Amorphous materials; Hardness; Nanostructures; Plasma processing and deposition

Indexed keywords

BOND STRENGTH (MATERIALS); DEPOSITION; FILM PREPARATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HARDNESS; HYDROCARBONS; INTERFACES (MATERIALS); ION BOMBARDMENT; MECHANICAL PROPERTIES; NANOSTRUCTURED MATERIALS; PLASMA APPLICATIONS; RAMAN SPECTROSCOPY;

AMORPHOUS HYDROCARBON FILMS; ATOMIC SCALE RANDOM NETWORK; INTRINSIC STRESS; NANOCOMPOSITE THIN FILMS; NEGATIVE BIAS VOLTAGE;

AMORPHOUS FILMS;

EID: 0030193649     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(95)08202-6     Document Type: Article

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