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Surface and Coatings Technology

Volumn 103-104, Issue , 1998, Pages 235-239

Formation of amorphous carbon thin films by plasma source ion implantation

(2) Baba, Koumei a Hatada, Ruriko a

a Technology Center of Nagasaki (Japan)

Author keywords

Amorphous carbon; Plasma; Plasma source ion implantation; Surface modification

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CARBON; DEPOSITION; INTERFACES (MATERIALS); ION IMPLANTATION; METHANE; PLASMA SOURCES; RAMAN SPECTROSCOPY; SILICON WAFERS; STAINLESS STEEL; SUBSTRATES; THIN FILMS;

ADHESIVE STRENGTH; AMORPHOUS CARBON FILM; FRICTION COEFFICIENT; PLASMA SOURCE ION IMPLANTATION;

AMORPHOUS FILMS;

EID: 18544411542 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(98)00401-0 Document Type: Article

Times cited : (43)

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