Fluorine-containing amorphous hydrogenated carbon films

Thin Solid Films

Volumn 281-282, Issue 1-2, 1996, Pages 294-297

  Durrant, Steven F ^a   Landers, Richard ^a   Kleiman, George G ^a   Castro, Sandra G ^a   Bica de Moraes, Mário A ^a  

^a UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

Chemical vapour deposition (CVD); Plasma processing and deposition; X ray photoelectron spectroscopy (XPS)

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; COMPOSITION; FLUORINE; HYDROGEN; MIXTURES; MONOMERS; PLASMA APPLICATIONS; REACTION KINETICS; VACUUM; X RAY PHOTOELECTRON SPECTROSCOPY;

ACTINOMETRIC OPTICAL EMISSION SPECTROSCOPY; COMONOMER; FLUORINATION; GAS PHASE REACTIONS; TETRAFLUOROMETHANE; TRIFLUOROTOLUENE;

AMORPHOUS FILMS;

EID: 13544264064     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08664-6     Document Type: Article

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