Leveling with step potential in damascene Cu electrodeposition

Journal of the Electrochemical Society

Volumn 153, Issue 12, 2006, Pages

  Cho, Sung Ki ^a   Kim, Jae Jeong ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MECHANICAL POLISHING; COPPER; DESORPTION; DISSOLUTION;

CHRONOAMPEROMETRY; DAMASCENE; TOPOGRAPHIC VARIATION;

ELECTRODEPOSITION;

EID: 33750809401     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2354459     Document Type: Article

References (18)

1. D. Josell, D. Wheeler, W. H. Huber, and T. P. Moffat, Phys. Rev. Lett., 87, 016102 (2001).
2. D. Josell, D. Wheeler, C. Witt, and T. P. Moffat, Electrochem. Solid-State Lett., 6, C143 (2003).
3. A. C. West, S. Mayer, and J. Reid, Electrochem. Solid-State Lett., 4, C50 (2001).
4. C. Yu and J. O. Dukovic, Abstract 168, The Electrochemical Society Meeting Abstracts, Vol. 2004-1, San Antonio, TX, May 9-13, 2004.
5. J. Reid, E. Webb, J. Sukamto, Y. Takada, and T. Archer, Abstract, 148, The Electrochemical Society Meeting Abstracts, Vol. 2004-1, San Antonio, TX, May 9-13, 2004.
6. B. B. Stickney, B. Nguyen, B. Basol, C. Uzoh, and H. Talieh, Solid State Technol., 46, 49 (2003).
7. O. Kardos, H. B. Durham, A. J. Tomson, and D. A. Arcilesi, U.S. Pat. 3,542,655 (1970).
8. O. Kardos, D. A. Arcilesi, A. J. Tomson, and S. P. Valayil, U.S. Pat. 3,682,788 (1972).
9. J. A. D. Jensen, P. Moller, T. Bruton, N. Mason, R. Russell, J. Hadley, P. Verhoeven, and A. Matthewson, J. Electrochem. Soc., 150, G49 (2003).
10. M. X. Yang, D. Mao, C. Yu, J. Dukovic, and M. Xi, Solid State Technol., 46, 37 (2003).
11. S.-M. Jang, U.S. Pat. 6,350,364 (2000).
12. S.-K. Kim, S. Hwang, S. K. Cho, and J. J. Kim, Electrochem. Solid-State Lett., 9, C25 (2006).
13. C.-F. Chen and K.-C. Lin, Jpn. J. Appl. Phys., Part 1, 41, 1981 (2002).
14. I. S. Zavarine, O. Khaselev, and Y. Zhang, J. Electrochem. Soc., 150, C202 (2003).
15. J. P. Healy and D. Pletcher, J. Electroanal. Chem., 338, 155 (1992).
16. T. P. Moffat, D. Wheeler, and D. Josell, J. Electrochem. Soc., 151, C262 (2004).
17. S.-K. Kim, S. K. Cho, J. J. Kim, and Y.-S. Lee, Electrochem. Solid-State Lett., 8, C19 (2005).
18. J. O. Dukovic, IBM J. Res. Dev., 34, 693 (1998).