메뉴 건너뛰기




Volumn 515, Issue 4, 2006, Pages 1922-1927

The role of ion bombardment process in the formation of insulating and semiconducting plasma deposited carbon-based films

Author keywords

Amorphous insulators; Amorphous semiconductors; Ion bombardment; Plasma deposition

Indexed keywords

AMORPHOUS MATERIALS; CARBON; FILM GROWTH; GLOW DISCHARGES; ION BOMBARDMENT; SEMICONDUCTOR MATERIALS;

EID: 33750798569     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.07.079     Document Type: Article
Times cited : (2)

References (32)
  • 2
    • 0038245475 scopus 로고    scopus 로고
    • Silva R.S.P. (Ed), IEE, London
    • In: Silva R.S.P. (Ed). Properties of Amorphous Carbon (2003), IEE, London
    • (2003) Properties of Amorphous Carbon
  • 9
    • 33750816905 scopus 로고    scopus 로고
    • Biederman H. (Ed), Imperial College Press, London
    • Tyczkowski J. In: Biederman H. (Ed). Plasma Polymers Films (2004), Imperial College Press, London 143
    • (2004) Plasma Polymers Films , pp. 143
    • Tyczkowski, J.1
  • 10
    • 33750818222 scopus 로고    scopus 로고
    • J. Tyczkowski, P. Kazimierski, W. Fallmann, F. Olcaytug, PL Patent No. 169688 B1, 30 Aug. 1996.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.