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Volumn 515, Issue 4, 2006, Pages 1922-1927
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The role of ion bombardment process in the formation of insulating and semiconducting plasma deposited carbon-based films
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Author keywords
Amorphous insulators; Amorphous semiconductors; Ion bombardment; Plasma deposition
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Indexed keywords
AMORPHOUS MATERIALS;
CARBON;
FILM GROWTH;
GLOW DISCHARGES;
ION BOMBARDMENT;
SEMICONDUCTOR MATERIALS;
AMORPHOUS INSULATORS;
AMORPHOUS SEMICONDUCTORS;
PLASMA DEPOSITION;
THIN FILMS;
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EID: 33750798569
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2006.07.079 Document Type: Article |
Times cited : (2)
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References (32)
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