Hydrogenated carbon films produced by plasma-enhanced CVD from pentane in a three-electrode reactor

Journal of Wide Bandgap Materials

Volumn 4, Issue 4, 1996, Pages 261-277

  Tyczkowski, J ^a   Pietrzyk, B ^a   Szymanowski, H ^a  

^a CENTRE OF MOLECULAR AND MACROMOLECULAR STUDIES   (Poland)

Author keywords

Amorphous hydrogenated carbon films; Electronic properties; Ion bombardment; Plasma deposition

Indexed keywords

CARBON; ELECTRIC CONDUCTIVITY; ELECTRIC INSULATORS; ELECTRIC REACTORS; ELECTROCHEMICAL ELECTRODES; ELECTRON TRANSITIONS; ELECTRONIC PROPERTIES; GERMANIUM; HYDROGENATION; ION BOMBARDMENT; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTOR MATERIALS; SILICON;

AMORPHOUS HYDROGENATED CARBON FILMS; ELECTRIC CONDUCTION; OPTICAL GAPS; PLASMA DEPOSITION;

AMORPHOUS FILMS;

EID: 23844459319     PISSN: 1524511X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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