Correlation between gas phase composition of rf plasma of argon diluted tetraethylgermanium and chemical structure of therewith deposited Ge/C films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 5, 1996, Pages 2835-2841

  Gazicki, M ^a   Szymanowski, H ^a   Tyczkowski, J ^a   Schalko, J ^b   Olcaytug, F ^b  

^a CENTRE OF MOLECULAR AND MACROMOLECULAR STUDIES   (Poland)

^b VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030522119     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580232     Document Type: Article

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