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Volumn 10, Issue 12, 1998, Pages 3879-3887

Hydrogenated carbon-lead films plasma-deposited from tetraethyllead in a three-electrode reactor

Author keywords

[No Author keywords available]

Indexed keywords


EID: 4243747464     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm980312p     Document Type: Article
Times cited : (4)

References (39)
  • 8
    • 3943110688 scopus 로고    scopus 로고
    • Binshi, X., Shining, M., Jiajun, L., Youli, Z., Eds.; China Machine Press: Shanghai
    • Tyczkowski, J.; Pietrzyk, B. In Surface Enginnering Towards the 21st Century; Binshi, X., Shining, M., Jiajun, L., Youli, Z., Eds.; China Machine Press: Shanghai, 1997; p 344.
    • (1997) Surface Enginnering Towards the 21st Century , pp. 344
    • Tyczkowski, J.1    Pietrzyk, B.2
  • 27
    • 0003666038 scopus 로고
    • Rossnagel, S. M., Cuomo, J. J., Westwood, W. D., Eds.; Noyes Publ.: Park Ridge
    • Kelly, R. Handbook of Plasma Processing Technology; Rossnagel, S. M., Cuomo, J. J., Westwood, W. D., Eds.; Noyes Publ.: Park Ridge, 1990.
    • (1990) Handbook of Plasma Processing Technology
    • Kelly, R.1
  • 36
    • 85159992082 scopus 로고    scopus 로고
    • Tyczkowski, J.; Pietrzyk, B. Unpublished results
    • Tyczkowski, J.; Pietrzyk, B. Unpublished results.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.