X-PEEM/NEXAFS and AFM of polypyrrole and copper micro-patterns on insulating fluoropolymer substrates

Applied Surface Science

Volumn 253, Issue 3, 2006, Pages 1473-1479

  Kappen, P ^a   Hale, P S ^a   Brack, N ^a   Prissanaroon, W ^a   Pigram, P J ^a  

^a LA TROBE UNIVERSITY   (Australia)

Author keywords

AFM; Micro patterns; NEXAFS; PEEM; Polypyrrole; Synchrotron radiation

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRON ENERGY LEVELS; POLYPYRROLES; PROPYLENE; SYNCHROTRON RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

HOMOGENEOUS DISTRIBUTIONS; NEAR EDGE X-RAY ABSORPTION FINE STRUCTURE (NEXAFS); PATTERN GROWTH; X-RAY PHOTOEMISSION ELECTRON MICROSCOPY (X-PEEM);

FLUORINE CONTAINING POLYMERS;

EID: 33750728005     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.02.030     Document Type: Article

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